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97%RG
97%
98%<10mum,
98%
99%RG
99%
99.0% min
99+%RG
≥99.0%ACSreagent,
≥99.0%
99.5%,40nmRG
99.5% metals basis,150-250nmRG
99.5% metals basis,50-100nmRG
99.5% metals basis,10μm
99.5%,100-200nm,球形
99.5%,40nm
99.5% metals basis, <50 nm
99.5% metals basis,150-250nm
99.5%,100-200nm
99.5% metals basis, 100-200nm
99.5% metals basis, 50-100nm
99.5% metals basis,50-100nm
99.5% metals basis
99.5%,50-100nm
99.7%(metals basis)
99.7% (metals basis)
99.9% metals basis,10μm
99.9% metals basis,1-2μm
99.99% metals basis,powderRG
99.99% metals basis,powder
99.99% trace metals
99.995% trace metals
99.995% trace metals basis, powder
99.995% trace metals basis,powder
99.999% trace metals basis,powder
99.999% trace metals
99.9995%(metals basis)
AR,99%
Puratronic®,99.995%(metals basis)
ACSreagent,
ACS reagent, mixture of CuO and Cu2O
ACS reagent, ≥99.0%
AR
元素分析仪专用
0.99
87%
87%,φ0.45mm
Φ:0.5mm,元素分析仪专用
40nm 球形,99.5%
14-30 mesh, extent of labeling: 13 wt. % loading
mixture of CuO and Cu2O, ACS reagent
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